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UPDATE 1-Moser Baer to up crystalline, thin-film capacity

Mon Jun 23, 2008 2:35pm IST
 
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NEW DELHI, June 23 (Reuters) - Moser Baer India Ltd (MOSR.BO: Quote, Profile, Research) will spend $250 million by March 2009 on expanding its crystalline silicon and thin-film production capacity at its plant in Greater Noida, a senior official said on Monday.

It will raise crystalline-silicon production capacity to 180 MW from 80 MW currently, and its thin-film capacity to 100 MW from 40 MW by then, Ravi Khanna, chief executive officer of Moser Baer's photo voltaic unit told reporters on the sidelines of an industry event.

Crystalline silicon and thin-films are used to make photo voltaic cells and modules, which convert sunlight into electricity.

Moser Baer has said it may list its photovoltaic unit as early as this year.

"We as a company are looking at options. We are evaluating the process of listing it internationally," Khanna said, but did not say when it would be listed or the amount sought to be raised.

Moser Baer Photo Voltaic Ltd contributed close to a tenth of Moser Baer's net sales of about 1 billion rupees in the year ended March 2008. (Reporting by Rakesh Sharma; editing by Sunil Nair)

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