Profile: ASML Holding NV (ASML.OQ)
11 Oct 2019
ASML Holding N.V., incorporated on October 3, 1994, is a holding company. The Company is a manufacturer of chip-making equipment. The Company is engaged in the development, production, marketing, selling and servicing of semiconductor equipment systems, consisting of lithography systems. The Company's products include systems, and installed base products and services. The Company's principal operations are in the Netherlands, the United States and Asia. Its subsidiaries include ASML Netherlands B.V., ASML Systems B.V., ASML Hong Kong Ltd. and ASML US Inc.
The Company offers TWINSCAN systems, equipped with lithography system with a mercury lamp as light source (i-line), Krypton Fluoride (KrF) and Argon Fluoride (ArF) light sources for 300 millimeter processing wafers for manufacturing environments for which imaging at a small resolution is required. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems). The TWINSCAN NXT platform enables semiconductors through the multiple patterning (MPT), which requires two or more exposures per layer on a chip, enabling imaging patterns and lines by using its TWINSCAN NXT planar wafer stage and grid metrology. The Company also offers NXE systems, which are equipped with extreme ultraviolet (EUV) light source technology.
The Company's lithography system product portfolio includes TWINSCAN Deep Ultra Violet (DUV) Systems, such as TWINSCAN XT:400, TWINSCAN XT:800, TWINSCAN XT:860 and TWINSCAN XT:1460, and TWINSCAN EUV Systems, such as NXE:3300, NXE:3350 and NXE:3400. The Company's Mature Products and Services (MPS) business refurbishes PAS 5500 and TWINSCAN lithography equipment, and offers associated services. As of December 31, 2016, the Company's PAS 5500 product family included wafer steppers, and Step and Scan systems equipped with i-line, KrF and ArF light sources for processing wafers of up to 200 millimeters in diameter.
Installed base products and services
The Company develops and sells a range of product options and enhancements to its systems. The Company complements its scanner products with a holistic lithography portfolio of software and metrology products. Its computational lithography products capture knowledge of scanner design and real performance, which enables its systems to predict real-life manufacturing performance. The Company's computational lithography portfolio consists of both traditional products, as well as solutions that directly interface with various calibration controls in its scanner. The Company also offers YieldStar, a wafer metrology system. The YieldStar wafer metrology system leverages the scanner controls to compensate for performance drifts in the scanner itself, as well as in other steps of the device manufacturing process, such as mask deterioration, resist coating fingerprints, etching fingerprints or chemical-mechanical polishing fingerprints. YieldStar uses scatterometry technology for overlay and critical dimension (CD) measurements. The Company offers its customers OnPulse contracts on DUV sources, providing on-site support from service engineers and continuous real-time light source monitoring.
The Company competes with Nikon Corporation, Canon Kabushiki Kaisha and KLA-Tencor Corporation.
ASML Holding NV
De Run 6501
VELDHOVEN 5504 DR
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